Dense yttrium oxyfluoride (YOF) coating was successfully deposited by suspension plasma
spraying (SPS) with coaxial feeding. After deposition for 6 min at a plasma power of 105 kW,
the thickness of the YOF coating was 35±3um with a porosity of 0.15% ± 0.01% and the coating rate
was ~9.2 um/min. The crystalline structure of trigonal YOF was confirmed by X-ray diractometry
(XRD). The etching behavior of the YOF coating was studied using inductively coupled CHF3/Ar
plasma in comparison with those of the Al2O3 bulk and Y2O3 coating. Crater-like erosion sites and
cavities were formed on the whole surface of the Al2O3 bulk and Y2O3 coating. In contrast, the
surface of the YOF coating showed no noticeable dierence before and after exposure to the CHF3/Ar
plasma. Such high resistance of the YOF coating to fluorocarbon plasma comes from the strongly
fluorinated layer on the surface. The fluorination on the surface of materials was confirmed by X-ray
photoelectron spectrum analysis XPS