Supttering Target Powders

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Nobium oxide Nb2O5 99.95% 15-45um/45-120um

Silicon oxide SiO2 99.9%  15-45um/45-120um

Tin oxide SnO2 99.9%  15-45um/45-120um

Zinc oxide ZnO2 99.9%  15-45um/45-120um

Titanium oxide TiO2 99.9%  15-45um/45-120um

Zirconium oxide ZrO2 99.5%  15-45um/45-120um

Al-Zn oxide AZO Al (1.3-2.0%) 120-325um

Sb-Sn oxide ATO Sb 10%120-325um

Sn-Zn oxide          (Sn 50%) 120-325um

Metal Zr-Si powder (Zr 36%) 100-325um

Metal Zr-Si powder (Zr 68%) 100-325um

Production process: Agglomeration, Sintering

Appearance: Spherical / Close spherical

Application: Used for the rotatable Sputtering target materials, Cylindrical sputtering target materials, Flat target materialsConductive ceramic diaphragm etc.