Sputtering Target Powders

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Supttering Target Powders

Nobium oxide NbOx 99.95% 0-45um/45-120um

Silicon oxide SiO 99.9%  0-45um/45-120um

Tin oxide SnO2 99.9%  0-45um/45-120um

Zinc oxide ZnO2 99.9%  0-45um/45-120um

Titanium oxide TiO 99.9%  0-45um/45-120um

Zirconium oxide ZrO2 99.5%  0-45um/45-120um

Al-Zn oxide AZO Al(1.3-2.0%) 120-325um

Sb-Sn oxide ATO (Sb 10%)120-325um

Sn-Zn oxide          (Sn 50%) 120-325um

Metal Zr-Si powder (Zr 36%) 100-325um

Metal Zr-Si powder (Zr 68%) 100-325um

Production process: agglomeration, Sintering

Appearance: Spherical

Application: Used for the rotatable Sputtering target materials, Cylindrical sputtering target materials, Flat target materials,Conductive ceramic diaphragm etc.